Laser annealing apparatus and a method for manufacturing a display apparatus using the laser annealing apparatus
US9460922B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 10, 2015 |
| Grant date | Oct 4, 2016 |
| Priority date | — |
| Expiry date | Nov 10, 2035 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23K2103/56
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A method of manufacturing a display apparatus includes forming an amorphous silicon layer on a substrate, splitting a first laser beam emitted from a first laser source into a first master beam in a first polarization state and a second master beam in a second polarization state, changing the first polarization state of the first master beam to the second polarization state to output a third master beam having the second polarization state and corresponding to the first master beam having the second polarization state, combining the second master beam with the third master beam to output a merged laser beam, and irradiating the amorphous silicon layer with the merged laser beam to form a polysilicon layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.