System and method of varying gate lengths of multiple cores
US9461040B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 6, 2015 |
| Grant date | Oct 4, 2016 |
| Priority date | — |
| Expiry date | Jul 6, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D89/10
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method includes forming a first gate of a first transistor, the first gate having a first length. The first transistor is located in a first core. The method also includes forming a second gate of a second transistor, the second gate having a second length that is shorter than the first length. The second transistor is located in a second core. The first core is located closer to a center of a semiconductor die than the second core. The second transistor and the first transistor are corresponding transistors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.