Optical apparatus, projection optical system, exposure apparatus, and method of manufacturing article
US9465294B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 4, 2014 |
| Grant date | Oct 11, 2016 |
| Priority date | — |
| Expiry date | Dec 23, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70266
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides an optical apparatus that deforms a reflecting surface of a mirror, comprising a base plate, a fixing member configured to fix a part of the mirror including a center of the mirror to the base plate, and a plurality of actuators each having a first end connected to the mirror and a second end connected to the base plate, and configured to apply force to a back face of the mirror, wherein the plurality of actuators include a plurality of first actuators and a plurality of second actuators, and the plurality of first actuators are arranged such that a distance between each first actuator and the center of the mirror is longer than half of a distance between the center and a periphery of the mirror.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.