Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method

US9469705B2 · kind B2 · utility

Assignee

• Rohm and Haas Electronic Materials LLC · US

Inventors

• Vipul Jain · Irvine, US
• Paul J. LaBeaume · Auburn, US
• James W. Thackeray · Braintree, US
• James F. Cameron · Brookline, US
• Suzanne M. Coley · Mansfield, US
• Amy M. Kwok · Shrewsbury, US
• David A. Valeri · Leominster, US

Key dates

• Filing date: Aug 24, 2015
• Grant date: Oct 18, 2016
• Expiry date: Aug 24, 2035

Classification

• Technology area (CPC —): General

Abstract

A polymer includes repeat units, at least half of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.