Lithography apparatus having effective thermal electron enhancement unit and method of forming pattern using the same
US9482953B2 · kind B2 · utility
2Cited by
8References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 11, 2014 |
| Grant date | Nov 1, 2016 |
| Priority date | — |
| Expiry date | Jun 7, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0002
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithography apparatus and a method of using the same, the apparatus including a stage for accommodating a substrate that has a photoresist film thereon; a main unit on the stage, the main unit being configured to irradiate a projection beam to the photoresist film; and an electric field unit adjacent to the stage, the electric field unit being configured to apply an electric field to the photoresist film, wherein the electric field unit is configured to be turned on at a same time as or before irradiation of the projection beam, and is configured to be turned off at a same time as or after termination of the projection beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.