Oxide thin film, method for post-treating oxide thin film and electronic apparatus
US9484419B2 · kind B2 · utility
0Cited by
0References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 12, 2015 |
| Grant date | Nov 1, 2016 |
| Priority date | — |
| Expiry date | Jun 12, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D30/6755
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Provided are an oxide thin film, a method for post-treating an oxide thin film and an electronic apparatus. An oxide thin film is an oxide thin film with a single layer including a metal oxide, and the physical properties of the oxide thin film may change in the thickness direction thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.