Method and system for reducing curtaining in charged particle beam sample preparation
US9488554B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 7, 2013 |
| Grant date | Nov 8, 2016 |
| Priority date | — |
| Expiry date | Oct 7, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31745
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and system for exposing a portion of a structure in a sample for observation in a charged particle beam system, including extracting a sample from a bulk sample; determining an orientation of the sample that reduces curtaining; mounting the sample to a holder in the charged particle beam system so that the holder orients the sample in an orientation that reduces curtaining when the sample is milled to expose the structure; exposing the structure by milling the sample in a direction that reduces curtaining; and imaging the structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.