Rule and lithographic process co-optimization
US9489479B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 16, 2013 |
| Grant date | Nov 8, 2016 |
| Priority date | — |
| Expiry date | Apr 30, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/05
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A computer-implemented method for obtaining values of one or more design variables of one or more design rules for a pattern transfer process comprising a lithographic projection apparatus, the method comprising: simultaneously optimizing one or more design variables of the pattern transfer process and the one or more design variables of the one or more design rules. The optimizing comprises evaluating a cost function that measures a metric characteristic of the pattern transfer process, the cost function being a function of one or more design variables of the pattern transfer process and one or more design variables of the one or more design rules.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.