Micro-electro-mechanical system based device for adjusting aperture and manufacturing method thereof
US9491340B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 21, 2013 |
| Grant date | Nov 8, 2016 |
| Priority date | — |
| Expiry date | May 30, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B9/02
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A micro-electro-mechanical system based device for adjusting aperture and a manufacturing method thereof are disclosed. The system includes: an opaque deformable aperture ring, multiple groups of conductive deformable crossbeams and conductive structs; and one or more fixed parts. In each group, each conductive deformable crossbeam corresponds to a conductive struct. The conductive deformable crossbeams and the conductive structs are arranged around the deformable aperture ring and spaced from each other. The conductive deformable crossbeams are suspended in the air, their inner edges are connected with an external edge of the deformable aperture ring, and their external edges are connected with the fixed parts. The conductive structs are connected with the fixed parts and remain stationary. Electrostatic force between the conductive deformable crossbeam and the conductive struct causes the deformable aperture ring to be stretched and rotate, so that area of an inner bore of the deformable aperture ring is changed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.