Lithographic projection objective

US9494868B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Olaf Rogalsky · Oberkochen, DE
• Boris Bittner · Roth, DE
• Thomas Petasch · Aalen, DE
• Jochen Haeussler · Hermaringen, DE

Key dates

• Filing date: Nov 7, 2013
• Grant date: Nov 15, 2016
• Expiry date: Apr 9, 2034

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70975
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Projection objectives, such as projection objectives of lithography projection exposure apparatuses, as well as related systems, components and methods, such as methods of revising and/or repairing such objectives, are disclosed.