Patent · US Active

Wafer position correction with a dual, side-by-side wafer transfer robot

US9496159B2 · kind B2 · utility

1Cited by
24References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 3, 2015
Grant dateNov 15, 2016
Priority date
Expiry dateMar 3, 2035

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S901/14
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Methods and systems for positioning wafers using a dual side-by-side end effector robot are provided. The methods involve performing place moves using dual side-by-side end effector robots with active wafer position correction. According to various embodiments, the methods may be used for placement into a process module, loadlock or other destination by a dual wafer transfer robot. The methods provide nearly double the throughput of a single wafer transfer schemes by transferring two wafers with the same number of moves.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.