Wafer position correction with a dual, side-by-side wafer transfer robot
US9496159B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 3, 2015 |
| Grant date | Nov 15, 2016 |
| Priority date | — |
| Expiry date | Mar 3, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S901/14
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Methods and systems for positioning wafers using a dual side-by-side end effector robot are provided. The methods involve performing place moves using dual side-by-side end effector robots with active wafer position correction. According to various embodiments, the methods may be used for placement into a process module, loadlock or other destination by a dual wafer transfer robot. The methods provide nearly double the throughput of a single wafer transfer schemes by transferring two wafers with the same number of moves.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.