Systems, methods, and apparatus for production coatings of low-emissivity glass including a ternary alloy
US9499899B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Dec 23, 2013 |
| Grant date | Nov 22, 2016 |
| Priority date | — |
| Expiry date | Dec 23, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/265
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Disclosed herein are systems, methods, and apparatus for forming low emissivity panels that may include a substrate and a reflective layer formed over the substrate. The low emissivity panels may further include a top dielectric layer formed over the reflective layer such that the reflective layer is formed between the top dielectric layer and the substrate. The top dielectric layer may include a ternary metal oxide, such as zinc tin aluminum oxide. The top dielectric layer may also include aluminum. The concentration of aluminum may be between about 1 atomic % and 15 atomic % or between about 2 atomic % and 10 atomic %. An atomic ratio of zinc to tin in the top dielectric layer may be between about 0.67 and about 1.5 or between about 0.9 and about 1.1.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.