Thin-film semiconductor optoelectronic device with textured front and/or back surface prepared from template layer and etching
US9502594B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 5, 2014 |
| Grant date | Nov 22, 2016 |
| Priority date | — |
| Expiry date | Aug 5, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
Abstract
A method for providing a textured layer in an optoelectronic device is disclosed. The method includes depositing a template layer on a first layer. The template layer has significant inhomogeneity either in thickness or in composition, or both, including the possibility of forming one or more islands to provide at least one textured surface of the island layer. The method also includes exposing the template layer and the first layer to an etching process to create or alter at least one textured surface. The altered at least one textured surface is operative to cause scattering of light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.