Lithographic apparatus and device manufacturing method
US9507277B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 4, 2011 |
| Grant date | Nov 29, 2016 |
| Priority date | — |
| Expiry date | Oct 1, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a sensor array positioned and arranged to detect an acoustic wave from a movable part of the lithographic apparatus, a controller, the controller having a controller input connected to the sensor array so as to receive a sensor array output signal, and a controller output connected to at least one actuator arranged to act on the movable part, the controller being arranged to: calculate a movement of the movable part from the sensor array output signal, and drive via the controller output the at least one actuator in response to the calculated movement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.