Patent · US Active

Wafer level overmold for three dimensional surfaces

US9508566B2 · kind B2 · utility

3Cited by
36References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 15, 2014
Grant dateNov 29, 2016
Priority date
Expiry dateAug 15, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/0002
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Embodiments of the invention include a method for shaping a flexible integrated circuit to a curvature and the resulting structure. A flexible circuit is provided. An epoxy resin and amine composition is deposited on the flexible integrated circuit. The deposited epoxy resin and amine composition is B-staged. The flexible integrated circuit is placed within a mold of a curvature. The B-staged epoxy resin and amine composition is cured subsequent to placing the flexible integrated circuit within the mold of the curvature.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.