Patent · US Active

Parallel single substrate marangoni module

US9508582B2 · kind B2 · utility

1Cited by
156References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 4, 2012
Grant dateNov 29, 2016
Priority date
Expiry dateJun 7, 2035

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/68707
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A substrate drying apparatus for drying a width of a surface of a substrate in a liquid. The substrate drying apparatus has a liquid tank containing the liquid. An injection nozzle is coupled to the liquid tank, the injection nozzle having a continuous knife edge injection surface across the width of the surface of the substrate. A drain is coupled to the injection nozzle, the drain having a continuous drain surface substantially parallel to the continuous knife edge injection surface and across the width of the surface of the substrate. The liquid forms a meniscus between the continuous drain surface and the width of the surface of the substrate. The injection nozzle directs a vapor at the meniscus.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.