Atomic layer deposition apparatus and method
US9512519B2 · kind B2 · utility
2Cited by
10References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 3, 2012 |
| Grant date | Dec 6, 2016 |
| Priority date | — |
| Expiry date | Dec 3, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0228
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An atomic layer deposition apparatus includes a chamber including a plurality of regions; and a heating device respectively providing specific temperature ranges for the plurality of regions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.