Inventor · Hsinchu, TW

Ming-Te Chen

40Patents
6h-index
63Co-inventors
72Inventor score

Filing activity: Jul 14, 2000 → Dec 23, 2024

Most-cited inventions

PatentTitleAreaCited byStatus
US8021992B2 High aspect ratio gap fill application using high density plasma chemical vapor deposition Electricity 20 Active
US7468326B2 Method of cleaning a wafer Electricity 19 Expired
US7229896B2 STI process for eliminating silicon nitride liner induced defects Electricity 15 Expired
US9543438B2 Contact resistance reduction technique Electricity 11 Active
US6975842B2 Mobile phone with battery latch Electricity 11 Expired
USD437372S Billiard cue General 8 Expired
US9209243B2 Method of forming a shallow trench isolation structure Electricity 3 Active
US11670553B2 Gate stack treatment Electricity 2 Active
US9512519B2 Atomic layer deposition apparatus and method Electricity 2 Active
US8677655B2 Shoe with anti-slip device Human Necessities 2 Active
US8540502B2 Adjustable shoe mold set Performing Operations; Transporting 1 Active
US8975155B2 Method of forming a shallow trench isolation structure Electricity 1 Active
US9982338B2 High-throughput system and method for post-implantation single wafer warm-up Electricity 1 Active
US7606021B2 Metal-insulator-metal capacitor and method for fabricating the same Emerging Cross-Sectional Technologies 1 Active
US11088029B2 Gate stack treatment Electricity 1 Active
US12300549B2 Gate stack treatment Electricity 0 Active
US11081584B2 Method of manufacturing semiconductor devices using a capping layer in forming gate electrode and semiconductor devices Electricity 0 Active
US9663854B2 High-throughput system and method for post-implantation single wafer warm-up Electricity 0 Active
USD1080624S1 Keyboard General 0 Active
US10858736B2 Atomic layer deposition method Electricity 0 Active
US11329160B2 FinFET gate structure Electricity 0 Active
US9589804B2 Method of forming finFET gate oxide Electricity 0 Active
US9378990B2 Adjusting intensity of laser beam during laser operation on a semiconductor device Electricity 0 Active
US10121637B2 Multi-platen ion implanter and method for implanting multiple substrates simultaneously Electricity 0 Active
US9606181B2 Processing apparatus, ion implantation apparatus and ion implantation method Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.