Patent · US Active

Projection exposure apparatus for microlithography for the production of semiconductor components

US9513562B2 · kind B2 · utility

0Cited by

5References

29Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Juergen Fischer · Adelsheim, DE
Armin Schoeppach · Aalen, DE
Matthias Orth · Langenau, DE
Norbert Muehlberger · Prien am Chiemsee, DE
Thorsten Rassel · Wertingen, DE
Armin Werber · Gottenheim, DE
Juergen Huber · Erlangen, DE

Key dates

Filing date	Sep 29, 2014
Grant date	Dec 6, 2016
Priority date	—
Expiry date	Dec 25, 2034

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70991
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.