Exposure apparatus and exposure method
US9513567B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 4, 2012 |
| Grant date | Dec 6, 2016 |
| Priority date | — |
| Expiry date | May 11, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67796
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
To provide a mask aligner that can appropriately manage very small-quantity production and multiproduct production. The present invention is a mask aligner 1 that exposes a wafer W in a predetermined size through a mask M, and has a configuration that includes: a conveying device 5 for conveying the wafer W and the mask M; an exposure stage 3f on which the wafer W conveyed by the conveying device 5 is installed; a mask holder 3b that is mounted to face the exposure stage 3f and on which the mask M conveyed by the conveying device 5 is installed; and an LED light source 8c mounted to face the exposure stage 3f via the mask holder 3b.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.