Group 5 cyclopentadienyl transition metal-containing precursors for deposition of group 5 transition metal-containing films

US9518075B2 · kind B2 · utility

Assignee

• L'Air Liquide, Societe Anonyme Pour l'Etude et l'Exploitation des Procedes Georges Claude · FR

Inventors

• Clément Lansalot-Matras · Tsukuba, JP
• Wontae Noh · Seoul, KR

Key dates

• Filing date: Dec 13, 2013
• Grant date: Dec 13, 2016
• Expiry date: Feb 12, 2035

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/18
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

Transition metal-containing precursors are disclosed. Also disclosed are methods of synthesizing and using the disclosed precursors to deposit transition metal-containing films on one or more substrates via a vapor deposition process.