Composition of matter and molecular resist made therefrom
US9519215B2 · kind B2 · utility
7Cited by
4References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 21, 2015 |
| Grant date | Dec 13, 2016 |
| Priority date | — |
| Expiry date | Dec 21, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K85/215
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The present application for patent discloses a composition of matter comprising: comprising a solvent; and an ester having a chemical structure chosen from (I), (II), or (III);wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms and A− is an anion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.