Systems and associated methods for tuning processing tools
US9519285B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 23, 2013 |
| Grant date | Dec 13, 2016 |
| Priority date | — |
| Expiry date | May 11, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B19/4065
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
The present disclosure provides various methods for tuning process parameters of a process tool, including systems for implementing such tuning. An exemplary method for tuning process parameters of a process tool such that the wafers processed by the process tool exhibit desired process monitor items includes defining behavior constraint criteria and sensitivity adjustment criteria; generating a set of possible tool tuning process parameter combinations using process monitor item data associated with wafers processed by the process tool, sensitivity data associated with a sensitivity of the process monitor items to each process parameter, the behavior constraint criteria, and the sensitivity adjustment criteria; generating a set of optimal tool tuning process parameter combinations from the set of possible tool tuning process parameter combinations; and configuring the process tool according to one of the optimal tool tuning process parameter combinations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.