Thin-film curvature measurement apparatus and method thereof
US9523572B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 26, 2014 |
| Grant date | Dec 20, 2016 |
| Priority date | — |
| Expiry date | Mar 20, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/255
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus for measuring of a curvature of a thin film, is adapted to measure the curvature of a thin-film. The apparatus includes a light emitting module, a first optical module, a second optical module, a third optical module, an image capture module, and an image analysis module. The light emitting module emits at least one line laser as an incident light whose cross-sectional shape is a geometric picture formed of lines. The incident light is transmitted through a first optical path formed of the first optical module, and is directed to incident the thin film by the second optical module. The reflected light is reflected by the thin film go through the second optical path, and is directed to transmit through the third optical path by the third optical module, and then is captured by the capture module to form a second geometric picture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.