Exposure apparatus with detection apparatus for detection of upper and lower surface marks, and device manufacturing method
US9523927B2 · kind B2 · utility
2Cited by
3References
8Claims
0Family size
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Key dates
| Filing date | Feb 8, 2013 |
| Grant date | Dec 20, 2016 |
| Priority date | — |
| Expiry date | Mar 15, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01S17/88
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A detection apparatus, which detects a mark formed on a lower surface of a target object, includes: a first detector which illuminates the mark from an upper surface side of the target object to detect an image of the illuminated mark; a second detector which detects an upper surface position of the target object; and a processor which obtains information indicating a focus position to focus on the mark in the first detector, based on the upper surface position detected by the second detector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.