End handler for film and film frames and a method thereof
US9524897B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 22, 2013 |
| Grant date | Dec 20, 2016 |
| Priority date | — |
| Expiry date | Mar 30, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68707
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An end handler and method for processing a device are presented. The end handler includes a mating portion for mating with a tool and a support portion for supporting a film frame on a support surface. The support portion includes a support base section, extension sections extending from the support base section, and vacuum ports on the support surface for facilitating mating of the film frame on the support surface. Each of the vacuum port includes at least one reservoir having at least one vacuum opening in fluid communication with at least one vacuum source. The vacuum ports being configured to principally maintain a slimmest profile with strongest suction force possible.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.