Methods and devices for correcting errors in atomic force microscopy
US9527732B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 26, 2011 |
| Grant date | Dec 27, 2016 |
| Priority date | — |
| Expiry date | Jan 2, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01Q10/06
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In certain embodiments, a probe scans a surface to produce a first scan. The first scan is used to estimate a vertical offset for scanning the surface to produce a second scan. In certain embodiments, an AFM device engages a probe to a surface using a piezo voltage. The probe scans the surface to produce a first scan. The first scan is used to estimate a vertical offset such that the probe uses the piezo voltage to engage the surface for a second scan at a different vertical position.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.