Patent · US Active

Methods and devices for correcting errors in atomic force microscopy

US9527732B2 · kind B2 · utility

2Cited by
20References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 26, 2011
Grant dateDec 27, 2016
Priority date
Expiry dateJan 2, 2034

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01Q10/06
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

In certain embodiments, a probe scans a surface to produce a first scan. The first scan is used to estimate a vertical offset for scanning the surface to produce a second scan. In certain embodiments, an AFM device engages a probe to a surface using a piezo voltage. The probe scans the surface to produce a first scan. The first scan is used to estimate a vertical offset such that the probe uses the piezo voltage to engage the surface for a second scan at a different vertical position.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.