Patent · US Active

Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method

US9527936B2 · kind B2 · utility

1Cited by

5References

7Claims

0Family size

Assignee

Rohm and Haas Electronic Materials LLC · US

Inventors

Vipul Jain · Irvine, US
Paul J. LaBeaume · Auburn, US
James W. Thackeray · Braintree, US
James F. Cameron · Brookline, US
Suzanne M. Coley · Mansfield, US
Amy M. Kwok · Shrewsbury, US
David A. Valeri · Leominster, US

Key dates

Filing date	Aug 24, 2015
Grant date	Dec 27, 2016
Priority date	—
Expiry date	Aug 24, 2035

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC08F220/387
WIPO fieldMacromolecular chemistry, polymers
WIPO sectorChemistry

Abstract

A polymer includes repeat units, at least half of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.