Patent · US Active

Method for attachment of an electrode into an inductively-coupled plasma

US9530625B2 · kind B2 · utility

0Cited by

3References

16Claims

0Family size

Assignee

FEI Company · US

Inventors

Sean Kellogg · Portland, US
Anthony Graupera · Hillsboro, US
William Parker · Hillsboro, US
Andrew B. Wells · Portland, US
Mark W. Utlaut · Scappoose, US
Walter Skoczylas · Beaverton, US
Gregory A. Schwind · Portland, US
Noel Smith · Lake Oswego, US
Shouyin Zhang · Livermore, US

Key dates

Filing date	Jun 9, 2015
Grant date	Dec 27, 2016
Priority date	—
Expiry date	Jun 9, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/032
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.