Patent · US Active

System and apparatus for holding a substrate over wide temperature range

US9530682B2 · kind B2 · utility

0Cited by
3References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 12, 2014
Grant dateDec 27, 2016
Priority date
Expiry dateAug 27, 2035

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/6833
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An apparatus to support a substrate may include a base, a clamp portion to apply a clamping voltage to the substrate, and a displacement assembly configured to hold the clamp portion and base together in a first operating position, and to move the clamp portion with respect to the base from the first operating position to a second operating position, wherein the clamp portion and base are separate from one another in the second operating position.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.