Grapho-epitaxy method for making patterns on the surface of a substrate

US9535329B2 · kind B2 · utility

Assignee

• COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES · FR

Inventors

• Patricia PIMENTA BARROS · Grenoble, FR
• Raluca Tiron · Saint-Égrève, FR
• Xavier Chevalier · Grenoble, FR
• Ahmed GHARBI · Grenoble, FR

Key dates

• Filing date: Sep 15, 2015
• Grant date: Jan 3, 2017
• Expiry date: Sep 15, 2035

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/3086
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A method for making patterns on a substrate, includes forming an assembly guide on first and second areas of the substrate, the assembly guide having, compared to a reference surface, openings with an opening ratio in the first area greater than that of the second area; depositing a block copolymer layer on the substrate to entirely fill the assembly guide and form an over-thickness on the reference surface; assembling the block copolymer, resulting in an organised portion of the block copolymer layer inside the openings; thinning uniformly the block copolymer layer, until a thickness corresponding to the organised portion of the block copolymer layer is reached; eliminating one of the phases of the assembled block copolymer, resulting in a plurality of initial patterns extending into the layer of block copolymer; and transferring the initial patterns of the block copolymer layer into the substrate to form the final patterns.