Patent · US Active

Microlithographic projection exposure apparatus

US9535336B2 · kind B2 · utility

0Cited by

1References

22Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Sascha Bleidistel · Aalen, DE
Yim-Bun Patrick Kwan · Aalen, DE
Florian Bach · Oberkochen, DE
Daniel Benz · Winnenden, DE
Severin Waldis · Aalen, DE
Armin Werber · Gottenheim, DE

Key dates

Filing date	May 22, 2014
Grant date	Jan 3, 2017
Priority date	—
Expiry date	Jan 23, 2035

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70891
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.