Method for avoiding artefacts during serial block face imaging

US9536704B2 · kind B2 · utility

Assignee

• Carl Zeiss Microscopy GmbH · DE

Inventors

• Matthias Langer · Heubach, DE
• Rainer Arnold · Obertshausen, DE
• Markus Esseling · Aalen, DE
• Jaroslaw Paluszynski · Oberkochen, DE

Key dates

• Filing date: Sep 9, 2013
• Grant date: Jan 3, 2017
• Expiry date: Nov 4, 2034

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/226
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A method includes capturing a first image of the sample via a detector, wherein the particles of the primary particle beam have a first average energy so that the interaction products detected by the detector predominantly contain sample information from a sample layer lying below the sample surface. The method also includes removing the outermost sample layer with the aid of the cutting device, and capturing a second image of the sample via the detector, wherein the particles of the primary particle beam have a second average energy so that the interaction products detected by the detector predominantly contain sample information from the surface layer of the sample. The method further includes calculating the lateral shift/lateral offset of the sample from a comparison of the first and second images, and compensating for the lateral offset.