Patent · US Active

Fabrication of complex three-dimensional structures based on directed assembly of self-assembling materials on activated two-dimensional templates

US9539788B2 · kind B2 · utility

1Cited by
22References
18Claims
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Key dates

Filing dateNov 27, 2013
Grant dateJan 10, 2017
Priority date
Expiry dateNov 23, 2034

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/269
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

Methods of fabricating complex three-dimensional structures on patterned substrates and related compositions are provided. The methods involve depositing on the substrate a block copolymer material that is “mismatched” to the substrate pattern, and then ordering the material to form a complex three-dimensional structure. According to various embodiments, the copolymer material mismatches the substrate pattern in that the symmetry and/or length scale of its bulk morphology differs from that of the pattern. When ordered, a balance between the physics that determines the bulk block copolymer morphology and the physics that determines the substrate surface interfacial interactions results in a thermodynamically stable complex three-dimensional film that varies in a direction perpendicular to the substrate and has a morphology that differs from its bulk morphology.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.