Method for producing a reflective optical component for an EUV projection exposure apparatus and component of this type

US9541685B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Holger Kierey · Aalen, DE
• Heiko Siekmann · Aalen, DE
• Andre Bresan · Aalen, DE

Key dates

• Filing date: Aug 20, 2013
• Grant date: Jan 10, 2017
• Expiry date: Sep 23, 2034

Classification

• Technology area (CPC G): Physics
• CPC primary: G21K2201/067
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A method for producing a reflective optical component for an EUV projection exposure apparatus, the component having a substrate having a base body, and a reflective layer arranged on the substrate, wherein the substrate has an optically operative microstructuring, comprises the following steps: working the microstructuring into the substrate, polishing the substrate after the microstructuring has been worked into the substrate, applying the reflective layer to the substrate. A reflective optical component for an EUV projection exposure apparatus correspondingly has a polished surface between the microstructuring and the reflective layer.