Method and system for preparing a pattern to be printed on a plate or mask by electron beam lithography
US9542505B2 · kind B2 · utility
Assignees
Inventor
Key dates
| Filing date | Aug 15, 2013 |
| Grant date | Jan 10, 2017 |
| Priority date | — |
| Expiry date | Nov 25, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31764
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method for preparing a pattern to be printed on a plate or mask by electron beam lithography comprising the following steps: modelling of the pattern by breaking down this pattern into a set of elementary geometric shapes intended to be printed individually in order to reproduce said pattern and, for each elementary geometric shape of the model; determination of an electrical charge dose to be applied to the electron beam during the individual printing of the elementary shape, this dose being chosen from a discrete set of doses including several non-zero predetermined doses recorded in memory. The set of elementary geometric shapes is a bidimensional paving of identical elementary geometric shapes covering the pattern to be printed. In addition, when the doses to be applied to the elementary geometric shapes are determined, a discretization error correction is made by dithering.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.