Vapor deposition of chalcogenide-containing films
US9543144B2 · kind B2 · utility
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3References
17Claims
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Key dates
| Filing date | Dec 31, 2014 |
| Grant date | Jan 10, 2017 |
| Priority date | — |
| Expiry date | Apr 15, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0262
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Chalcogenide-containing film forming compositions, methods of synthesizing the same, and methods of forming Chalcogenide-containing films on one or more substrates via vapor deposition processes using the Chalcogenide-containing film forming compositions are disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.