Patent · US Active

Illumination system for an EUV lithography device and facet mirror therefor

US9551941B2 · kind B2 · utility

1Cited by

2References

24Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Johannes Ruoff · Aalen, DE
Ingo Saenger · Heidenheim, DE
Joerg Zimmermann · Vancouver, CA
Daniel Kraehmer · Aalen, DE
Christoph Hennerkes · Wertingen, DE
Frank Schlesener · Oberkochen, DE

Key dates

Filing date	Jul 10, 2015
Grant date	Jan 24, 2017
Priority date	—
Expiry date	Aug 23, 2035

Classification

Technology area (CPC G)Physics
CPC primaryG02B26/0833
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The invention relates to an illumination system for an EUV lithography device, comprising: a first facet mirror having facet elements that reflect EUV radiation, and a second facet mirror having facet elements for reflecting the EUV radiation reflected by the first facet mirror onto an illumination field. At least one of the facet elements of the first facet mirror or of the second facet mirror is designed as a diffractive optical element for diffracting the EUV radiation. In particular, at least one of the facet elements of the second facet mirror is designed as a diffractive optical element for illuminating only a part of the illumination field. The invention also relates to an EUV lithography device comprising such an illumination system, and to a facet mirror comprising at least one diffractive facet element.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.