Patent · US Active

Particle beam system

US9552957B2 · kind B2 · utility

7Cited by

1References

23Claims

0Family size

Assignee

Carl Zeiss Microscopy GmbH · DE

Inventors

Dirk Zeidler · Oberkochen, DE
Thomas Kemen · Meppen, DE
Christof Riedesel · Oberkochen, DE
Ralf Lenke · Lauchheim, DE

Key dates

Filing date	May 28, 2015
Grant date	Jan 24, 2017
Priority date	—
Expiry date	May 28, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/1202
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Particle beam system comprising a particle source; a first multi-aperture plate with a multiplicity of openings downstream of which particle beams are formed; a second multi-aperture plate with a multiplicity of openings which are penetrated by the particle beams; an aperture plate with an opening which is penetrated by all the particles which also penetrate the openings in the first and the second multi-aperture plate; a third multi-aperture plate with a multiplicity of openings which are penetrated by the particle beams, and with a multiplicity of field generators which respectively provide a dipole field or quadrupole field for a beam; and a controller for feeding electric potentials to the multi-aperture plates and the aperture plate so that the second openings in the second multi-aperture plate respectively act as a lens on the particle beams and feed adjustable excitations to the field generators.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.