Patent · US Active

Interconnect structure for wafer level package

US9553000B2 · kind B2 · utility

10Cited by
32References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 28, 2015
Grant dateJan 24, 2017
Priority date
Expiry dateDec 28, 2035

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/181
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A package includes a device die having a substrate. A molding compound contacts a sidewall of the substrate. A metal pad is over the substrate. A passivation layer has a portion covering an edge portion of the metal pad. A metal pillar is over and contacting the metal pad. A dielectric layer is over the passivation layer. A package material formed of a molding compound or a polymer is over the dielectric layer. The dielectric layer includes a bottom portion between the passivation layer and the package material, and a sidewall portion between a sidewall of the metal pillar and a sidewall of the package material. A polymer layer is over the package material, the molding compound, and the metal pillar. A post-passivation interconnect (PPI) extends into the polymer layer. A solder ball is over the PPI, and is electrically coupled to the metal pad through the PPI.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.