Substrate treatment method and substrate treatment apparatus
US9555452B2 · kind B2 · utility
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7Claims
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Key dates
| Filing date | Aug 11, 2014 |
| Grant date | Jan 31, 2017 |
| Priority date | — |
| Expiry date | Aug 11, 2034 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B7/0071
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A substrate treatment method is provided, which includes a liquid film retaining step of retaining a liquid film of a treatment liquid on a major surface of a substrate, and a heater heating step of locating a heater in opposed relation to the major surface of the substrate to heat the treatment liquid film by the heater in the liquid film retaining step, wherein an output of the heater is changed from a previous output level in the heater heating step.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.