Orientation control materials for block copolymers used in directed self-assembly applications

US9556353B2 · kind B2 · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Joy Cheng · San Jose, US
• Anindarupa Chunder · San Jose, US
• Melia Tjio · San Jose, US
• Ankit Vora · San Jose, US

Key dates

• Filing date: Oct 29, 2014
• Grant date: Jan 31, 2017
• Expiry date: Oct 29, 2034

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C08F2438/01
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

An orientation control layer (OCL) for self-assembly of block copolymers comprises a random copolymer comprising a first repeat unit having an ethylenic backbone functional group and a side chain aromatic ring, a second repeat unit comprising an ethylenic backbone functional group and a side chain polycarbonate, and a third repeat unit comprising an ethylenic backbone functional group and a side chain ester or amide bearing an active group capable of forming a covalent bond with a substrate surface (e.g., a silicon wafer). The OCLs are neutral wetting to block copolymers having a high Flory-Huggins interaction parameter chi (χ) (“high-chi” block copolymers) such as a block copolymer comprising a polystyrene block and a polycarbonate block. The neutral OCL wetting properties allow for formation of lamellar domain patterns of the self-assembled high-chi block copolymers to be oriented perpendicular to the OCL surface.