Patent · US Active

Photoresist composition and associated method of forming an electronic device

US9557642B2 · kind B2 · utility

4Cited by

5References

7Claims

0Family size

Assignee

Rohm and Haas Electronic Materials LLC · US

Inventors

Paul J. LaBeaume · Auburn, US
Vipul Jain · Irvine, US
Suzanne M. Coley · Mansfield, US
James W. Thackeray · Braintree, US
James F. Cameron · Brookline, US
Amy M. Kwok · Shrewsbury, US
David A. Valeri · Leominster, US

Key dates

Filing date	Aug 24, 2015
Grant date	Jan 31, 2017
Priority date	—
Expiry date	Aug 24, 2035

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC08F220/382
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.