Method for forming a metal silicide using a solution containing gold ions and fluorine ions
US9564333B2 · kind B2 · utility
0Cited by
5References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 21, 2014 |
| Grant date | Feb 7, 2017 |
| Priority date | — |
| Expiry date | Feb 21, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A subject matter of the invention is a process for the formation of nickel silicide or of cobalt silicide, comprising the stages consisting in: The aqueous solution comprises a surface-active agent chosen from the compounds comprising at least one anionic or nonionic polar group and an alkyl chain comprising from 10 to 16 carbon atoms.This process essentially has applications in the manufacture of NAND memories and photovoltaic cells.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.