Method for making patterns on the surface of a substrate using block copolymers

US9566610B2 · kind B2 · utility

Assignees

• CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE · FR
• COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES · FR

Inventors

• Raluca Tiron · Saint-Égrève, FR
• Stephanie Gaugiran · Grenoble, FR
• Xavier Chevalier · Grenoble, FR
• Serge Tedesco · Meylan, FR

Key dates

• Filing date: May 18, 2012
• Grant date: Feb 14, 2017
• Expiry date: Apr 11, 2033

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/0337
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A method for making patterns on the surface of a substrate by graphoepitaxy, includes depositing a layer of resin on the surface of the substrate; making patterns in the resin on the surface of a substrate; curing the patterns in the resin by producing a layer of amorphous carbon on the surface of the patterns in the resin; depositing a layer of statistical copolymer after curing the patterns in the resin; grafting the layer of statistical copolymer onto the patterns in the resin by annealing; and depositing a layer of a block copolymer into the spaces defined by the patterns in the resin after curing the patterns and the grafting of the layer of statistical copolymer.