Patent · US Active

Mirror for use in a microlithography projection exposure apparatus

US9568845B2 · kind B2 · utility

0Cited by

4References

6Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Martin Rocktaeschel · Aalen, DE
Hartmut Enkisch · Aalen, DE
Franz-Josef Stickel · Aalen, DE
Oliver Natt · Aalen, DE
Hans-Juergen Mann · Oberkochen, DE
Sascha Migura · Aalen, DE

Key dates

Filing date	Mar 12, 2012
Grant date	Feb 14, 2017
Priority date	—
Expiry date	May 10, 2034

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70316
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A mirror including a substrate and a reflective coating that includes a first group of layers and a second group of layers arranged between the substrate and the first group of layers. Both the first and second groups of layers include a plurality of alternating first material layers and second material layers, arranged one above another. The refractive index of the first material for radiation in the range of 5-30 nm is greater than the refractive index of the second material in that wavelength range. The first group of layers is configured to have a number of layers that is greater than 20, such that, upon irradiation with radiation having a wavelength in the range of 5-30 nm, less than 20% of the radiation reaches the second group of layers, which has a layer thickness variation for correcting the surface form of the mirror.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.