Automated image-based process monitoring and control
US9569834B2 · kind B2 · utility
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12Claims
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Key dates
| Filing date | Jun 22, 2015 |
| Grant date | Feb 14, 2017 |
| Priority date | — |
| Expiry date | Jun 22, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Methods and devices are disclosed for automated detection of a status of wafer fabrication process based on images. The methods advantageously use segment masks to enhance the signal-to-noise ratio of the images. Metrics are then calculated for the segment mask variations in order to determine one or more combinations of segment masks and metrics that are predictive of a process non-compliance. A model can be generated as a result of the process. In another embodiment, a method uses a model to monitor a process for compliance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.