Method of analyzing at least two inhibitors simultaneously in a plating bath
US9575032B2 · kind B2 · utility
0Cited by
5References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 7, 2014 |
| Grant date | Feb 21, 2017 |
| Priority date | — |
| Expiry date | Jul 14, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N27/26
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The presently claimed invention provides an accurate, fast, and cost effective method for determining the additive concentrations of at least two inhibitors simultaneously in an electroplating bath by using different electrical load conditions. The method of the present invention is able to determine additive concentrations of different inhibitors effectively during on-line feedback control for adjusting the amount of additives in the electroplating bath to maintain the additive concentrations within pre-defined limits during device production.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.