Patent · US Active

Processes and apparatus for preparing heterostructures with reduced strain by radial compression

US9583364B2 · kind B2 · utility

6Cited by
19References
15Claims
0Family size

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Key dates

Filing dateDec 27, 2013
Grant dateFeb 28, 2017
Priority date
Expiry dateJan 9, 2035

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/6875
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Apparatus and processes for preparing heterostructures with reduced strain are disclosed. The heterostructures may include a semiconductor structure that conforms to a surface layer having a different crystal lattice constant than the structure to form a relatively low-defect heterostructure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.