Gas cushion apparatus and techniques for substrate coating
US9586226B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 27, 2015 |
| Grant date | Mar 7, 2017 |
| Priority date | — |
| Expiry date | Apr 27, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/0091
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A coating can be provided on a substrate. Fabrication of the coating can include forming a solid layer in a specified region of the substrate while supporting the substrate in a coating system using a gas cushion. For example, a liquid coating can be printed over the specified region while the substrate is supported by the gas cushion. The substrate can be held for a specified duration after the printing the patterned liquid. The substrate can be conveyed to a treatment zone while supported using the gas cushion. The liquid coating can be treated to provide the solid layer including continuing to support the substrate using the gas cushion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.